Overview

Focoused on the study of metals, alloys, minerals, inorganic and organic compounds, polymers, and amorphous materials, this laboratory uses electrical, structural, and optical characterisation techniques to study materials.

List of equipments

X-Ray Diffractometer (XRD)

X-ray diffraction analysis investigates structure through the use of diffraction. When X-radiation interacts with the electrons of a substance, the X rays are diffracted. The diffraction pattern depends on the wavelength of the X rays employed and on the structure of the object. Radiation of wavelength ~ 1 angstrom (Å), that is, of the order of atomic dimensions, is used to investigate atomic structure. The methods of X-ray diffraction analysis are used to study, for example, metals, alloys, minerals, inorganic and organic compounds, polymers, amorphous materials, liquids, gases, and the molecules of proteins and nucleic acids. X-ray diffraction analysis has been used most successfully to establish the atomic structure of crystalline substances because crystals have a rigid periodicity of structure and constitute naturally produced diffraction gratings for X rays.

Hall-Effect Measurement System

The Hall effect provides a relatively simple method for doing this. Because of its simplicity, low cost, and fast turnaround time, it is an indispensable characterization technique in the semiconductor industry and in research laboratories. The discovery of the Hall effect enabled a direct measure of the carrier density. The polarity of this transverse Hall voltage proved that it is in fact electrons that are physically moving in an electric current. Development of the technique has since led to a mature and practical tool, which today is used routinely for characterizing the electrical properties and quality of almost the entire semiconductor materials used by industry and in research labs throughout the world.

Ellipsometer

Ellipsometry is a well-established method for thin film analysis. It provides material parameters like n and k even for arbitrary anisotropic layers, film thicknesses in the range down to a few Ångström, and ellipsometry is used to analyze the shape of nm-scale surface structures. But, the determination of such manifold information by means of light polarization changing upon reflection at a sample surface requires appropriate optical models.

Thermo Gravimetric Analyzer(TGA)

Thermogravimetric analysis or thermal gravimetric analysis (TGA) is a method of thermal analysis in which changes in physical and chemical properties of materials are measured as a function of increasing temperature (with constant heating rate), or as a function of time (with constant temperature and/or constant mass loss). TGA can provide information about physical phenomena, such as second-order phase transitions, including vaporization, sublimation, absorption, adsorption, and desorption. Likewise, TGA can provide information about chemical phenomena including chemisorptions, desolvation (especially dehydration), decomposition, and solid-gas reactions (e.g., oxidation or reduction).

X-Ray Fluorescence System (XRF)

X-ray fluorescence (XRF) is the emission of characteristic "secondary" (or fluorescent) X-rays from a material that has been excited by bombarding with high-energy X-rays or gamma rays. The phenomenon is widely used for elemental analysis and chemical analysis, particularly in the investigation of metals, glass, ceramics and building materials, and for research in geochemistry, forensic science and archaeology.

Thin Film Thermal Evaporation System

Thermal Evaporation involves heating a solid material inside a high vacuum chamber, taking it to a temperature which produces some vapor pressure. Inside the vacuum, even a relatively low vapor pressure is sufficient to raise a vapor cloud inside the chamber. This evaporated material now constitutes a vapor stream, which traverses the chamber and hits the substrate, sticking to it as a coating or film.

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